东北大学学报（自然科学版）

东北大学学报(自然科学版) ›› 2008, Vol. 29 ›› Issue (6): 885-888.DOI: -

• 论著 • 上一篇    下一篇

用PEM监控制备TiO_2薄膜及其光学性能的研究

段永利;巴德纯;许生;范垂祯;   

  1. 东北大学机械工程与自动化学院;东北大学机械工程与自动化学院;深圳豪威真空光电子股份有限公司;深圳豪威真空光电子股份有限公司 辽宁沈阳110004;辽宁沈阳110004;广东深圳518057;广东深圳518057
  • 收稿日期:2013-06-22 修回日期:2013-06-22 出版日期:2008-06-15 发布日期:2013-06-22
  • 通讯作者: Duan, Y.-L.
  • 作者简介:-
  • 基金资助:
    国家高技术研究发展计划项目(2004AA303540)

Optical properties of TiO2 thin films deposited by PEM controlled reactive sputtering

Duan, Yong-Li (1); Ba, De-Chun (1); Xu, Sheng (2); Fan, Chui-Zhen (2)   

  1. (1) School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110004, China; (2) Shenzhen Hivac Vacuum Photo-Electronics Co. Ltd., Shenzhen 518057, China
  • Received:2013-06-22 Revised:2013-06-22 Online:2008-06-15 Published:2013-06-22
  • Contact: Duan, Y.-L.
  • About author:-
  • Supported by:
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摘要： 使用金属钛作靶材,利用中频反应磁控溅射方法在玻璃基底上制备了TiO2薄膜.为使反应溅射的工作点能够稳定在"过渡区",使薄膜获得理想的化学配比和较高的沉积速率,使用了等离子体发射光谱监控法(PEM)对溅射过程进行控制.利用台阶仪测膜厚,用X射线衍射仪、原子力显微镜、分光光度计以及光学薄膜测试分析仪等手段对TiO2薄膜的结构以及光学性能进行表征,研究了不同工艺条件对薄膜结构和光学性能的影响.结果表明,较高的PEM工作点下制备的TiO2薄膜具有较高的折射率,使用PEM控制的中频反应磁控溅射方法可以制备出性能良好的TiO2光学薄膜.

关键词: TiO2薄膜, 反应溅射, PEM控制, 光学性能, 薄膜结构

Abstract: Titanium dioxide thin films for optical applications were deposited on glass substrates by reactive mid-frequency (MF) magnetron sputtering with two Ti metal targets. To obtain a high deposition rate, the plasma emission monitor (PEM) was used to control the sputtering process. The structure and dynamic deposition rate of the films deposited with various deposition parameters were investigated by surface profiler, XRD and AFM, and the optical properties were measured and calculated by spectrophotometer and thin-film analyzer. The results showed that higher PEM setpoints can enable the films to have higher reflective index. In short, the TiO2 thin films prepared in this way can provide favorable optical properties.

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