关键词: Ti-N-C薄膜, 非平衡磁控溅射, 中频溅射靶, 晶体结构, 离子束辅助沉积

Abstract: Introducing the Hall ion source assisted MF unbalanced magnetron sputtering process with twin targets, the Ti/TiN/Ti (C, N) anti-wear hard films were deposited on such substrates as stainless and high-speed steels through changing the working ambience, bias mode, sputtering current and ion beam assisted current. The color, crystal structure and film's bonding strength are all tested and analyzed. The results showed that the color of films is highly sensitive to testing ambience, and the slight change in working ambience enables the film surface color to change greatly. No obvious preferred orientation is found in the crystal structure of the films prepared within the normal intake range of reaction gas and low bias voltage of substrate. But, a trend of preferred orientation of crystal plane will take place if the intake of reaction gas is excessive. The effect of unbalanced magnetron process on the preferred orientation of film's crystal structure is not great. And the bonding strength of films can be increased efficiently if applying Hall current in the film deposition process.