Abstract: Titanium dioxide thin films for optical applications were deposited on glass substrates by reactive mid-frequency (MF) magnetron sputtering with two Ti metal targets. To obtain a high deposition rate, the plasma emission monitor (PEM) was used to control the sputtering process. The structure and dynamic deposition rate of the films deposited with various deposition parameters were investigated by surface profiler, XRD and AFM, and the optical properties were measured and calculated by spectrophotometer and thin-film analyzer. The results showed that higher PEM setpoints can enable the films to have higher reflective index. In short, the TiO2 thin films prepared in this way can provide favorable optical properties.