Abstract: SrTiO3 (STO) thin films were grown on Si(100) substrates and Si(110) substrates with V-grooves by liquid phase deposition (LPD) and RF magnetron sputtering, respectively. In order to obtain high quality STO films by LPD, the influences of sedimentary solution temperature, substrate surface treatment methods, substrate placement and heat treatment process were investigated. In order to obtain high quality STO films with certain orientation at low substrate temperature by RF magnetron sputtering, the specific parameters, including sputtering power, sputtering pressure, annealing temperature and substrate temperature, were studied. The results showed that the crystalline state, texture, and surface morphology of STO films prepared by RF magnetron sputtering are better than those by LPD.