Journal of Northeastern University Natural Science ›› 2014, Vol. 35 ›› Issue (9): 1284-1288.DOI: 10.12068/j.issn.1005-3026.2014.09.016

• Materials & Metallurgy • Previous Articles     Next Articles

Solid Boronizing on the Surface of Pure Titanium TA1 and Titanium Alloy TC4

LI Fenghua, DONG Mengge, WANG Lina, FAN Zhanguo   

  1. School of Materials & Metallurgy, Northeastern University, Shenyang 110819, China.
  • Received:2013-10-30 Revised:2013-10-30 Online:2014-09-15 Published:2014-04-11
  • Contact: LI Fenghua
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Abstract: The solid powder boronizing, on the surface of titanium alloys with matrix structure αTi of TA1 and(α+β)Ti of TC4, was investigated. The morphology of boride layer was observed by polarizing microscope and scanning electron microscope(SEM). The phase composition of boride layer was analyzed by Xray diffraction(XRD). The results show that when boronizing temperature is in the range of 850~1000℃, diffusion layers on TA1 in a multilayer structure are paralleled to the surface of the substrate, which composes of Ti3O and TiB phases. When the temperature is higher than 920℃, TiB becomes the major component in the diffusion layer with TiB2, and the content of titanium borides increases with temperature. When the temperature is lower than 1000℃, Ti3O and TiB are the major components of the layer on TC4. When it is higher than 1000℃, the layer is TiB2 and TiB whisker. Boronizing temperature above 1000℃ is the sufficient condition for the formation of titanium borides.

Key words: pure titanium TA1, titanium alloy TC4, titanium boride, solid boronizing, diffusion kinetics

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