Journal of Northeastern University ›› 2012, Vol. 33 ›› Issue (8): 1174-1178.DOI: -

• OriginalPaper • Previous Articles     Next Articles

Effect of post-annealing temperature on optical and electrical properties of Li:ZnO thin films

Li, Jian-Chang (1); Li, Yong-Kuan (1); Jiang, Yong-Hui (1); Ba, De-Chun (1)   

  1. (1) School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110819, China
  • Received:2013-06-19 Revised:2013-06-19 Published:2013-04-04
  • Contact: Li, J.-C.
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Abstract: 3 at.% Li-doped ZnO films were prepared by sol-gel spin-coating. The influence of post-annealing at 450~650°C on the film structural, optical and electrical properties was investigated. All the films show a polycrystalline hexagonal wurtzite structure and n-type conductivity. The rising annealing temperature facilitates the crystallization and improves the transmittance and conductivity. However, by annealing above 550°C, the film conductivity decreases and the oxide/electrode contacts change from the Schottky to ohmic type. The intrinsic reason is the supplantation of the interstitial Li-dopants by the substitutional ones and therefore the ZnO work function increases, as confirmed by the I-U simulating results. At annealing temperatures above 600°C, the samples are revaporised, resulting in poor optical-electrical properties. The optimum annealing temperature is 550°C, with a transmittance of 95% and a resistance of 2.49×103 Ω·cm, demonstrating the applicability of Li-doped ZnO as high-quality transparent conductive films.

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