NING Jiu-xin， HUANG Hai-long， WANG Xiao-dong， SUN Hao. Simulation Investigation on Discharge and Ion Transport of Pumping Units for Sputter Ion Pumps[J]. Journal of Northeastern University Natural Science, 2020, 41(7): 962-967.
[1]杨乃恒.真空获得设备［M］.北京:冶金工业出版社，1987.(Yang Nai-heng.Vacuum production device［M］.Beijing:Metallurgical Industry Press，1987.) [2]Hall L D.Electronic ultra-high vacuum pump［J］.Review of Scientific Instruments，1958，29(5):367-370. [3]杨树贵，周卓.反应磁控溅射离子镀TiN膜的工艺参数［J］.东北工学院学报，1987，8(3):376-380.(Yang Shu-gui，Zhou Zhuo.Technological parameters of TiN-ion sputter coating using reaction magnetron［J］.Journal of Northeast University of Technology，1987，8(3):376-380.) [4]Vesel A，Mozetic M，Kovac J，et al.XPS study of the deposited Ti layer in a magnetron-type sputter ion pump［J］.Applied Surface Science，2006，253(5):2941-2946. [5]Williamson A，Rivnay J，Kergoat L，et al.Epilepsy treatment:controlling epileptiform activity with organic electronic ion pumps［J］.Advanced Materials，2015，27(20):3138-3144. [6]Green S R，Malhotra R，Gianchandani Y B.Sub-torr chip-scale sputter-ion pump based on a Penning cell array architecture［J］.Journal of Microelectromechanical Systems，2013，22(2):309-317. [7]Sigmund P.Theory of sputtering:I.sputtering yield of amorphous and polycrystalline targets［J］.Physical Review，1969，184(2):383-416. [8]Eninger J E.Experimental investigation of electron cloud containment in a nonuniform magnetic field［R］.Massachusetts:Avco-Everett Research Laboratory，1974. [9]Rohwer P，Baumann H，Schütze W，et al.Studies of the center potential in a Penning discharge［J］.Nuclear Instruments and Methods in Physics Research，1983，211(2/3):543-546. [10]Porcelli T，Siviero F，Bongiorno G，et al.Growth of microscopic cones on titanium cathodes of sputter-ion pumps driven by sorption of large argon quantities［J］.Journal of Vacuum Science & Technology A:Vacuum Surfaces & Films，2015，33(5):05E109-1-05E109-8. [11]何炜，王仁康，耿天鹏.溅射离子泵的抽速计算［J］.真空科学与技术，1982(4):5-14.(He Wei，Wang Ren-kang，Geng Tian-peng.Calculation of pumping speed of sputtering ion pump［J］.Chinese Journal of Vacuum Science and Technology，1982(4):5-14.) [12]Mesyats G A.Ecton processes in the generation of pulsed runaway electron beams in a gas discharge［J］.Plasma Physics Reports，2017，43(9):952-956. [13]石磊，钱沐杨，肖坤祥，等.低气压条件下氢气潘宁放电的模拟分析［J］.物理学报，2013，62(17):339-345.(Shi Lei，Qian Mu-yang，Xiao Kun-xiang，et al.Simulation study on hydrogen Penning source discharge at low pressure［J］.Acta Physica Sinica，2013，62(17):339-345.) [14]Matsunami N，Yamamura Y，Itikawa Y，et al.Energy dependence of the ion-induced sputtering yields of monatomic solids［J］.Atomic Data & Nuclear Data Tables，1984，31(1):1-80. [15]Cercignani C.The Boltzmann equation and its applications［M］.Berlin:Springer-Verlag，1988. [16]Hagelaar G J M，Pitchford L C.Solving the Boltzmann equation to obtain electron transport coefficients and rate coefficients for fluid models［J］.Plasma Sources Science and Technology，2005，14(4):722-733. [15]关守平，房少纯.一种新型的区间-粒子群优化算法［J］.东北大学学报(自然科学版)，2012，33(10):1381-1384.(Guan Shou-ping，Fang Shao-chun.A new interval particle swarm optimization algorithm［J］.Journal of Northeastern University(Natural Science)，2012，33(10):1381-1384.)
