Journal of Northeastern University ›› 2013, Vol. 34 ›› Issue (6): 859-862.DOI: -

• Materials & Metallurgy • Previous Articles     Next Articles

Preparation of TiO2 Thin Biofilm on NiTi Alloy by Activation Sputtering Method

GAO Shuchun1, ZHAI Yuchun1, JIANG Da2, WANG Qiushi1   

  1. 1. School of Materials & Metallurgy, Northeastern University, Shenyang 110819, China; 2. School of Materials Science and Engineering, Shenyang Aerospace University, Shenyang 110136, China.
  • Received:2012-12-11 Revised:2012-12-11 Online:2013-06-15 Published:2013-12-31
  • Contact: GAO Shuchun
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Abstract: Based on different sputtering voltage conditions, nanometer titanium dioxide biofilm was prepared on NiTi shape memory alloy surface by the activation sputtering method. The influences of the sputtering voltage on the thickness of the film and crystal structure were studied by the step profiler and Raman spectrum. The corrosion resistance of the NiTi alloy and TiO2coated NiTi alloy was evaluated in simulated body fluid at 37℃, respectively. Results showed that under the condition of this experiment the thin film was anatase structure, and the major constituent was nanometer titanium dioxide. The titanium dioxide thin films effectively improved the corrosion resistance of the NiTi alloy in simulated body fluid at 37℃.

Key words: NiTi shape memory alloy, activation sputtering, TiO2 thin films, sputtering voltage

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