Abstract: A modified immune clone selection algorithm is proposed for the non-identical parallel lithography machine scheduling problem of the bottleneck process with energy consumption， changeover time and resource constraints， where multiple reticles are available for each reticle type. Firstly， the scheduling problem domain is described and mathematical programming formulations are put forward with the objective function of minimizing both the total weighted completion time and the energy consumption. Based on the model， then a modified multi-objective immune clone selection algorithm with elitist strategy is developed. In addition， the depth neighbor search and the population renewal operator are combined to the algorithm to increase and balance the exploration and exploitation ability. Finally， simulation experiments and theory analysis are carried out to evaluate the as-proposed algorithm， and the results indicate that the algorithm is valid and feasible.

Key words: scheduling, resource, energy consumption, immune clone selection algorithm, multi-objective